離子束蝕刻,濺鍍機

廠牌: E.A.Fischione , Inc. 型號: Model 1030 Automated Sample Preparation System (ASPS)

應用:
此系統同時包含Plasma Cleaning(PC),Ion Beam Etching(IBE),Reactive Ion Beam Etching(RIBE),Reactive Ion Etching(RIE),Ion Beam Sputter Coating(IBSC)等功能,可以依據不同之材料試片,提供不同之物理或化學蝕刻,等向性或非等向性,高選擇比或低選擇比等不同之蝕刻方式,以即濺鍍薄膜,應用於半導體試片,LCD試片,金屬材料等各式材料SEM試片表面之全處理.

優點:
◎ Five functions in continuous vacuum.
◎ Rapid sample processing.
◎ Automatic operation with user-defined process sequence.
◎ Easy-to-use interface.
◎ Samples up to 1 in. (25mm) diameter and 1.0 in. (25mm) thick.
◎ Consistent results.
◎ Automatically adjusts all instrument parameters.
◎ Automatic sample height detection.
◎ Rapidly pumped airlock.
◎ Oil-free vacuum system
◎ Continuous vacuum.